Atomic layer deposition (ALD) originated from atomic layer epitaxy, which was introduced in 1970 and initially used in electroluminescent displays. It rapidly revolutionized semiconducting ...

Designed for demanding semiconductor applications, the UltiDry combines robust performance with high energy efficiency ...

The Dutch spatial atomic layer deposition equipment manufacturer has launched a new sheet-to-sheet tool for pilot production of large area perovskite solar devices on glass substrates.

Forge Nano's breakthrough changes that equation completely by simultaneously delivering 1000:1 aspect ratio conformality, ALD-quality film uniformity and speed. This is one of the rare semiconductor ...

Kalpana Systems, a Dutch equipment manufacturer, is launching spatial atomic layer deposition (sALD) tools to be used in roll-to-roll manufacturing processes in the solar PV, organic light emitting ...

Evaluating the role of ALD coatings in strengthening thermal resilience and longevity in solar long metal tubes.

High-speed hydrogen-free encapsulation using FCVA deposition improves OLED moisture barrier performance, preserves TFT stability, and nearly doubles flexible device lifetime compared with ALD.

What is Atomic Layer Etching? Atomic layer etching (ALE) is a highly controlled and selective etching technique that removes material layer by layer at the atomic scale. It is a cyclic process that ...